Gaasaska gaarka ah
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Sulfur Tetrafluoride (SF4)
EINECS NO: 232-013-4
CAS NO: 7783-60-0 -
Nitrous oxide (N2O)
Nitrous oxide, oo sidoo kale loo yaqaano gaasta qosolka, waa kiimiko khatar ah oo leh qaacidada kiimikada N2O. Waa gaas aan midab lahayn, oo udgoon. N2O waa oksaydhiyaha taageeri kara gubashada xaaladaha qaarkood, laakiin ku xasiloon heerkulka qolka oo leh saameyn suuxdin yar. , oo dadka ka qosli kara. -
Kaarboon Tetrafluoride (CF4)
Kaarboon tetrafluoride, oo sidoo kale loo yaqaan tetrafluoromethane, waa gaas aan midab lahayn oo heerkul caadi ah iyo cadaadis, aan lagu milmin biyaha. Gaaska CF4 ayaa hadda ah gaaska etching plasma ee loogu isticmaalka badan yahay warshadaha microelectronics. Waxa kale oo loo isticmaalaa sidii gaaska laysarka, qaboojiye cryogenic, dareere, lubricant, walxo dahaarka, iyo qaboojiyaha tuubooyinka wax baadha infrared. -
Sulfuryl fluoride (F2O2S)
Sulfuryl fluoride SO2F2, gaas sun ah, waxaa inta badan loo isticmaalaa sidii cayayaanka. Sababtoo ah sulfuryl fluoride waxay leedahay sifooyin faafin xoog leh iyo qulqulitaan, cayayaan ballaaran oo ballaaran, qiyaas yar, qadar yar oo hadhaaga ah, xawaaraha cayayaanka degdega ah, wakhtiga fidinta gaasta gaaban, isticmaalka habboon ee heerkulka hooseeya, wax saameyn ah kuma yeelan heerka biqilka iyo sunta hoose, in ka badan. Waxaa aad iyo aad loogu isticmaalaa bakhaarrada, maraakiibta xamuulka, dhismayaasha, biyo-xireennada kaydka, ka-hortagga jeexjeexyada, iwm. -
Silane (SiH4)
Silane SiH4 waa mid aan midab lahayn, sun ah oo aad u firfircoon gaas cadaadis leh heerkulka caadiga ah iyo cadaadiska. Silane waxaa si weyn loogu isticmaalaa kobaca epitaxial ee silikoon, alaabta ceeriin ee polysilicon, silicon oxide, silicon nitride, iwm, unugyada qoraxda, fiilooyinka indhaha, soo saarista muraayadaha midabka leh, iyo kaydinta uumiga kiimikada. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, daahirsanaanta gaaska: 99.999%, oo inta badan loo isticmaalo sida cuntada aerosol-ka iyo gaaska dhexdhexaadka ah. Waxaa inta badan loo isticmaalaa in semiconductor PECVD (Plasma Enhance. Kaydinta uumiga kiimikada), C4F8 waxaa loo isticmaalaa beddelka CF4 ama C2F6, loo isticmaalo sida gaaska nadiifinta iyo semiconductor habka etching gaaska. -
Nitric Oxide (MAYA)
Gaaska Nitric oxide waa ka kooban nitrogen oo leh qaacidada kiimikada ee NO. Waa gaas aan midab lahayn, ur lahayn, sun ah oo aan biyo ku milmin. Nitric oxide kiimiko ahaan aad buu u falceliyaa waxayna la falgashaa ogsijiin si ay u samayso gaaska daxalka leh ee nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gaas waa gaas aan midab lahayn oo leh ur ur daran. Xalkeeda biyaha waxaa lagu magacaabaa hydrochloric acid, sidoo kale loo yaqaan hydrochloric acid. Hydrogen chloride waxaa inta badan loo isticmaalaa in lagu sameeyo dheeha, xawaashka, dawooyinka, chlorides kala duwan iyo ka hortagga daxalka. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, formula kiimikaad: C3F6, waa gaas aan midab lahayn heerkulka caadiga ah iyo cadaadiska. Waxaa inta badan loo isticmaalaa in lagu diyaariyo noocyo kala duwan oo fluorine-ka kooban kiimiko ganaax, dhexda dawooyinka, wakiilada dab-demiska, iwm, iyo sidoo kale waxaa loo isticmaali karaa in lagu diyaariyo fluorine-ka kooban polymer. -
Ammonia (NH3)
Ammonia dareere ah / anhydrous ammonia waa walxo kiimiko ah oo ceeriin ah oo muhiim ah oo leh codsiyo kala duwan. Ammonia dareeraha ah waxaa loo isticmaali karaa qaboojiye ahaan. Inta badan waxaa loo isticmaalaa in lagu soo saaro nitric acid, urea iyo bacriminta kiimikada kale, waxaana sidoo kale loo isticmaali karaa sida alaabta ceeriin ee daawada iyo sunta cayayaanka. Warshadaha difaaca, waxa loo isticmaalaa in laga sameeyo gantaalada iyo gantaalaha.
