Teknolojiyadda enthing ee qallalan ayaa ka mid ah geedi socodka muhiimka ah. Gaaska qallalan ee gaaska waa shey muhiim ah oo ku saabsan wax soosaarka semiconductor iyo ilo muhiim ah oo loogu talagalay plasma ething. Waxqabadkeedu si toos ah ayuu u saameeyaa tayada iyo waxqabadka sheyga ugu dambeeya. Qodobkaani wuxuu inta badan la wadaagaa waxa ay yihiin gaasaska sida caadiga ah loo isticmaalo ee ku dhaca geesaha engega ee enthing.
Gaaska ku saleysan fluorinine: sidakaarboon tetrnluoride (cf4), HexafLorothoethane (c2F6), Trifluoromethane (CHF3) iyo Perflurotropane (C3F8). Gas-yadaani waxay si wax ku ool ah u abuuri karaan foloraydhyo kacsan marka ay ku sugan yihiin xeryaha silicon iyo silicon, sidaasna ay ku gaaraan ka saarida maaddada.
Gaasaska ku saleysan koloriin-ku-saleysan: sida koloriin (cl2),Boron Trichloride (BCL3)iyo silicon tetrachloride (Sicl4). Gaasaska ku saleysan koloriinku waxay bixin karaan ion-ka kororiin ah inta lagu gudajiro geedi socodka etching, kaas oo gacan ka geysta hagaajinta heerka korantada iyo xulashada.
Gaasaska ku saleysan Brominin-ku-saleysan: sida bromine (B2) iyo Brominine Ioodide (Ibr). Gaasaska ku saleysan Brominin-ku-saleysan waxay ku siin karaan wax qabad wanaagsan oo ka mid ah howlaha korantada qaarkood, gaar ahaan marka ay ku jiraan alaabada adag sida silicon carbide.
Gaasaska ku saleysan nitroggen iyo oksijiin-ku-saleysan: sida nitrogen trifluoride (NF3) iyo oksijiin (O2). Gas-yaradan waxaa badanaa loo isticmaalaa in lagu hagaajiyo xaaladaha fal-celinta ee hanaanka etching si loo wanaajiyo xulashada iyo socod eegista cudurka.
Gas-gadaani waxay ku guuleystaan irinka sare ee dusha sare ee dusha sare ee isku darka isku darka jirka iyo falcelin kiimikaad inta lagu jiro plasma ething. Xulashada gaaska korantada waxay kuxirantahay nooca walxaha la imanayo, shuruudaha xulashada ee wajahan, iyo heerka la doonayo.
Waqtiga Post: Feb-08-2025
