Tignoolajiyada etching qallalan waa mid ka mid ah geeddi-socodka muhiimka ah. Gaaska etching ee qallalan waa shay muhiim ah oo soo saara semiconductor iyo ilo gaas oo muhiim u ah etching plasma. Waxqabadkeedu wuxuu si toos ah u saameeyaa tayada iyo waxqabadka alaabta ugu dambeysa. Maqaalkani waxa uu inta badan la wadaagaa waxa ay yihiin gaasasyada cuncunka ee sida caadiga ah loo isticmaalo habka etching etching.
Gaasaska ku salaysan fluorine: sidaKaarboon tetrafluoride (CF4), hexafluoroethane (C2F6), trifluoromethane (CHF3) iyo perfluoropropane (C3F8). Gaasasahan ayaa si wax ku ool ah u dhalin kara fluoride kacsan marka ay xoqayaan silikoon iyo xeryahooda silikoon, si ay u gaaraan ka saarista walxaha.
Gaasaska ku salaysan koloriin: sida koloriin (Cl2),boron trichloride (BCl3)iyo silicon tetrachloride (SiCl4). Gaasas-ku-saleysan koloriin ayaa bixin kara ion koloriin inta lagu jiro habka etching, kaas oo gacan ka geysta hagaajinta heerka etching iyo xulashada.
Gaasaska ku salaysan bromine: sida bromine (Br2) iyo bromine iodide (IBr). Gaasas-ku-saleysan bromine waxay ku siin karaan waxqabad wanaagsan oo etching hababka qaar ka mid ah, gaar ahaan marka la xoqo walxaha adag sida silikoon carbide.
Gaasaska ku salaysan Nitrojiin iyo ogsijiin ku salaysan: sida nitrogen trifluoride (NF3) iyo ogsijiin (O2). Gaasasahan waxaa badanaa loo isticmaalaa in lagu hagaajiyo xaaladaha falcelinta ee habka etching si loo hagaajiyo xulashada iyo jihaynta etching.
Gaasasaskani waxay gaadhaan xoqin sax ah oo dusha shay ah iyada oo la isu geynayo candhuuf jireed iyo falcelin kiimikaad inta lagu jiro etching balaasmaha. Doorashada gaaska etching waxay kuxirantahay nooca walxaha la xardhaynayo, shuruudaha xulashada ee etching, iyo heerka etching ee la rabo.
Waqtiga boostada: Feb-08-2025
