Epitaxial (koritaan)Isku-dhafka Gas

Warshadaha semiconductor-ka, gaaska loo isticmaalo in lagu beero hal ama in ka badan lakab oo walxo ah iyadoo la adeegsanayo uumiga kiimikada ee ku yaal substrate si taxaddar leh loo xushay waxaa loo yaqaan gaaska epitaxial.

Gaasaska epitaxial ee silikoon ee caadiga ah loo isticmaalo waxaa ka mid ah dichlorosilane, silicon tetrachloride iyosilaneWaxaa inta badan loo isticmaalaa dhigista silikoonka epitaxial, dhigista filimka silikoon oxide, dhigista filimka silikoon nitride, dhigista filimka silikoon ee aan qaab lahayn ee unugyada qorraxda iyo sawir-qaadayaasha kale, iwm. Epitaxy waa hab lagu shubo oo lagu beero hal walxo kiristaal ah oo dusha sare ah.

Kaydinta Uumiga Kiimikada (CVD) Gaas Isku Jir ah

CVD waa hab lagu shubo walxo iyo iskudhisyo gaar ah iyadoo la adeegsanayo falgallada kiimikada ee marxaladda gaaska iyadoo la adeegsanayo iskudhisyo isbeddelaya, tusaale ahaan, habka sameynta filim iyadoo la adeegsanayo falgallada kiimikada marxaladda gaaska. Iyada oo ku xidhan nooca filimka la sameeyay, gaaska kiimikada ee la kaydiyo uumiga (CVD) ee la isticmaalo sidoo kale waa ka duwan yahay.

DawayntaGaas Isku Jir ah

Soo saarista aaladaha semiconductor-ka iyo wareegyada isku dhafan, wasakh gaar ah ayaa lagu shubaa walxaha semiconductor-ka si loo siiyo agabka nooca conductivity-ga loo baahan yahay iyo iska caabin gaar ah si loo soo saaro iska caabin, isgoysyada PN, lakabyada la aasay, iwm. Gaaska loo isticmaalo habka doping-ka waxaa loo yaqaan gaaska doping.

Waxaa ugu badan arsine, phosphine, fosfooraska trifluoride, fosfooraska pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, iwm.

Badanaa, isha daawada waxaa lagu qasaa gaas side (sida argon iyo nitrogen) oo ku jira armaajo isha ah. Ka dib marka la isku daro, socodka gaaska ayaa si joogto ah loogu duraa foornada faafinta wuxuuna ku wareegsan yahay waferka, isagoo ku shubaya dopants dusha sare ee waferka, ka dibna wuxuu la falgalaa silikoon si uu u soo saaro biraha la dahaadhay ee u guura silikoon.

QalinIsku darka Gaaska

Qallajinta waa in meesha laga saaro dusha wax lagu farsameeyo (sida filimka birta ah, filimka silicon oxide, iwm.) ee ku yaal substrate-ka iyada oo aan la isticmaalin maaskaro sawir-celin ah, iyadoo aagga lagu ilaalinayo maaskaro sawir-celin ah, si loo helo qaabka sawir-qaadista ee loo baahan yahay ee dusha sare ee substrate-ka.

Hababka lagu xoqo waxaa ka mid ah xoqidda kiimikada qoyan iyo xoqidda kiimikada qalalan. Gaaska loo isticmaalo qodidda kiimikada qalalan waxaa loo yaqaan gaaska qodidda.

Gaaska wax lagu qalajiyo badanaa waa gaaska fluoride (halide), sidakaarboon tetrafluoride, nitrogen trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, iwm.