Epitaxial (koritaanka)Isku-dhafka Gas

Warshadaha semiconductor-ka, gaaska loo isticmaalo in lagu beero hal ama dhowr lakab oo shay ah iyadoo la dhigayo uumiga kiimikaad ee substrate si taxadar leh loo doortay waxaa loo yaqaannaa gaaska epitaxial.

Gaasaska Epitaxial Silicon ee sida caadiga ah loo isticmaalo waxaa ka mid ah dichlorosilane, silicon tetrachloride iyosilaanyo. Inta badan loo isticmaalo dhigaalka silikoon epitaxial, dhigaalka silikoon oxide film, dhigaalka silikoon nitride film, dhigaalka film silikon amorphous ee unugyada qoraxda iyo sawiro kale, iwm

Kaydka Uumiga Kiimikada (CVD) Gaaska Isku-dhafan

CVD waa hab lagu kaydiyo walxaha iyo iskudhisyada qaarkood falcelinta kiimikaad ee wejiga gaaska iyadoo la isticmaalayo xeryahooda kacsan, tusaale ahaan, habka samaynta filim iyadoo la isticmaalayo falcelinta kiimikaad wajiga gaaska. Iyada oo ku xidhan nooca filimka la sameeyay, kaydinta uumiga kiimikaad (CVD) gaaska la isticmaalo sidoo kale wuu ka duwan yahay.

DopingGaas isku dhafan

In wax soo saarka ee qalabka semiconductor iyo wareegyada isku dhafan, wasakhda qaar ka mid ah waxaa lagu shubay galay qalab semiconductor si ay u siiyaan alaabta nooca conductivity loo baahan yahay iyo iska caabin gaar ah si ay u soo saaraan resistors, isku dhafka PN, lakabyada la aasay, iwm. Gaaska loo isticmaalo habka doping waxaa loo yaqaan gaaska doping.

Inta badan waxaa ku jira arsine, phosphine, fosfooraska trifluoride, fosfooraska pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, iwm.

Caadi ahaan, isha doping-ka waxaa lagu qasaa gaaska side (sida argon iyo nitrogen) ee ku jira golaha ilo. Ka dib marka la isku daro, socodka gaaska ayaa si joogto ah loogu duraa foornada faafinta oo ku hareeraysan maraqa, ku dhejinta dopants dusha sare ee waferka, ka dibna ka falcelin silikoon si ay u abuurto biro dhogor ah oo u guura silikon.

xoqinIsku-dhafka Gaaska

Etching waa in la tirtiro oogada farsamaynta (sida filimka birta ah, filimka silicon oxide, iwm.) ee substrate-ka iyada oo aan la daboolin sawir-qaadista, iyada oo la ilaalinayo aagga maaskarada sawir-celinta, si loo helo qaabka sawirka loo baahan yahay ee dusha sare ee substrate.

Hababka xoqidda waxaa ka mid ah xoqin kiimiko qoyan iyo cuncun kiimiko oo qallalan. Gaaska loo isticmaalo etching kiimikaad ee etching waxaa loo yaqaannaa gaaska etching.

Gaaska cuncunka badanaa waa gaaska fluoride (halide), sidakaarboon tetrafluoride, nitrogen trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, iwm.