Tilmaamid | 99.999% |
Ogsajiin+Argon | ≤1pm |
Nitrojiin | ≤4 ppm |
Qoyaanka (H2O) | ≤3 ppm |
HF | ≤0.1 ppm |
CO | ≤0.1 ppm |
CO2 | ≤1 ppm |
SF6 | ≤1 ppm |
Halocarbynes | ≤1 ppm |
Wadarta wasakhda | ≤10 ppm |
Kaarboon tetrafluoride waa hydrocarbon halogenated oo leh qaacidada kiimikada CF4. Waxa loo tixgalin karaa sida hydrocarbon halogenated, methane halogenated, perfluorocarbon, ama sida iskudhis aan organic ahayn. Kaarboon tetrafluoride waa gaas aan midab iyo ur lahayn, aan lagu milmi karin biyaha, ku milma benzene iyo chloroform. Ku xasilloon heerkulka caadiga ah iyo cadaadiska, ka fogow oksidants xooggan, walxaha guban ama guban kara. Gaaska aan guban, cadaadiska gudaha ee weelka ayaa kordhin doona marka uu la kulmo kuleyl sare, waxaana jira khatar ah dildilaac iyo qarax. Kiimiko ahaan waa u xasilloon oo aan guban karin. Keliya dareeraha ammonia-sodium reagent birta ayaa ka shaqayn kara heerkulka qolka. Kaarboon tetrafluoride waa gaas sababa saamaynta aqalka dhirta lagu koriyo. Aad bay u deggan tahay, waxay ku jiri kartaa jawiga waqti dheer, waana gaas aqalka dhirta lagu koriyo oo aad u xoog badan. Kaarboon tetrafluoride waxaa loo isticmaalaa habka etching plasma ee wareegyada isku dhafan ee kala duwan. Waxa kale oo loo isticmaalaa sida gaaska laysarka, waxaana loo isticmaalaa qaboojiyaha heerkulka hooseeya, dareerayaasha, saliidaha, walxaha dahaadhka, iyo qaboojiyeyaasha loogu talagalay qalabka wax baara ee infrared. Waa gaaska etching ee ugu badan ee loo isticmaalo warshadaha microelectronics. Waa isku dhafka tetrafluoromethane gaas saafi ah oo saafi ah iyo tetrafluoromethane gaas saafi ah oo saafi ah iyo ogsijiin saafi ah. Waxaa si weyn loogu isticmaali karaa silikoon, Silicon dioxide, silicon nitride, iyo galaaska fosfosilicate. Qalabaynta alaabta khafiifka ah sida tungsten iyo tungsten ayaa sidoo kale si weyn loogu isticmaalaa nadiifinta dusha sare ee qalabka elektiroonigga ah, soosaarka unugyada qorraxda, tignoolajiyada laser, qaboojiyaha heerkulka hooseeya, kormeerka qulqulka, iyo saabuunta wax soo saarka wareegga daabacan. Loo isticmaalo qaboojiye heerkul hooseeya iyo tignoolajiyada etching ee balaasmaha ee wareegyada isku dhafan. Ka taxadar kaydinta: Ku kaydi bakhaar gaas qabow oo hawo leh oo aan guban karin. Ka fogow dabka iyo ilaha kulaylka. Heerkulka kaydinta waa inuusan dhaafin 30 ° C. Waa in si gooni ah loo kaydiyaa si fudud (ka gubta) kuwa guban kara iyo oksaydhiyeyaasha, kana fogow kaydinta isku dhafan. Aagga kaydinta waa in lagu qalabeeyaa qalabka daaweynta degdega ah ee daadsan.
① Qaboojiyaha:
Tetrafluoromethane waxaa mararka qaarkood loo isticmaalaa qaboojiye heerkul hoose ah.
② Cuncun:
Waxaa loo isticmaalaa qalabka elektarooniga ah oo keliya ama lagu daro ogsijiinta sida balaasmaha silikoon, silicon dioxide, iyo silicon nitride.
Alaabta | Kaarboon TetrafluorideCF4 | ||
Cabbirka Xidhmada | 40Ltr Silinder | Silinder 50Ltr | |
Buuxinta miisaanka saafiga ah/Cyl | 30kgs | 38kg | |
QTY Waxay ku Raaceen 20' Konteenar | 250 Cyl | 250 Cyl | |
Wadarta miisaanka saafiga ah | 7.5 tan | 9.5 tan | |
Silinder Tare Miisaanka | 50Kgs | 55kg | |
Valve | CGA 580 |
①Nadiif sare, xaruntii ugu dambaysay;
② soo saaraha shahaadada ISO;
③Dhismaha degdega ah;
④ Nidaamka falanqaynta khadka tooska ah ee xakamaynta tayada tallaabo kasta;
⑤ Shuruuda sare iyo habka taxadarka leh ee wax looga qabanayo dhululubada ka hor inta aan la buuxin;